| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1894637205a6363e54f3117d66b6fa14 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-3209
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-36
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02052
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D11-0047
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-265 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D11-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D7-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D7-36
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D7-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02 |
| filingDate |
2017-12-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7b030830202668a1d656bc60b8c355b1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d95957089f50b2524ab2f992eb015e09
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b76ab6681f7ff93ad45a0d6db2ec0e43
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cc9a25afc191fdb2dc555e015fb70acd |
| publicationDate |
2019-07-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20190079990-A |
| titleOfInvention |
Cleaning solution composition |
| abstract |
The present invention relates to a cleaning liquid composition comprising an organic acid; Phosphonic acid chelating agents; And a diol amine compound, and relates to a cleaning liquid composition used after a chemical mechanical polishing process of a wafer for a semiconductor device containing a metal. |
| priorityDate |
2017-12-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |