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publicationDate 2019-07-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20190078425-A
titleOfInvention Measuring method of phosphate coverage
abstract In one embodiment of the present invention, there is provided a method of manufacturing a semiconductor device, comprising the steps of: subjecting a substrate to a phosphate treatment, performing copper plating on the phosphate-treated substrate to form copper plating on the phosphate crystal- And calculating an area ratio to calculate a phosphate coverage.
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