http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20190077931-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2f94790cf5bf17ef5799ba79a953aa57 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67017 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-68764 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-67 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-687 |
| filingDate | 2017-12-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9d17513004bddfb95306658802c403c6 |
| publicationDate | 2019-07-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20190077931-A |
| titleOfInvention | Apparatus for Processing Substrate |
| abstract | The present invention provides a plasma processing apparatus comprising: a supporting unit which rotates about a rotation axis so that a plurality of substrates revolve around a rotation axis; A lead disposed on the upper side of the support portion; A jetting portion for jetting a process gas into a plurality of processing regions arranged along an orbiting path in which the substrates revolve about the rotation axis; A purge section for injecting the purge gas; And a diffusion preventing portion protruding from the support portion toward the lead in a central region disposed inside the processing regions. |
| priorityDate | 2017-12-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 21.