| abstract |
A composition comprising a cobalt compound, a method of making the cobalt compound, and a cobalt metal film precursor used to deposit a cobalt-containing film (e.g., cobalt, cobalt oxide, cobalt nitride, etc.) is disclosed herein. Examples of cobalt precursor compounds are (alkyne) dicobalt hexacarbonyl compounds, cobalt enamine compounds, cobalt monoazadiene, and (functionalized alkyl) cobalt tetracarbonyl. Examples of surfaces for deposition of a metal-containing film include, but are not limited to, metals, metal oxides, metal nitrides, and metal silicides. Functionalized ligands having groups such as amino, nitrile, imino, hydroxyl, aldehyde, ester, halogen, and carboxylic acid have excellent film properties such as selective deposition and / or uniformity, continuity, . |