http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20190057018-A

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6f932d94618d9b875e401457b33e9761
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F1-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F1-30
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F1-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F1-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K13-06
filingDate 2018-11-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4984491cd8120fd673842a8b57a9e515
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_88640cfb3296544c53b9750addaaa7df
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9ed1b7e3fecc5a3e823ad944defb1486
publicationDate 2019-05-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20190057018-A
titleOfInvention Etchant composition for silver thin layer and ehting method and mehtod for fabrication metal pattern using the same
abstract The present invention relates to a silver thin film etchant composition comprising an organic acid, an inorganic acid, a etch initiator, and a residual amount of water, and having an Etch stop index of 0.05 to 0.35, an etching method using the same, and a method of forming a metal pattern.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11639470-B2
priorityDate 2017-11-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20140063283-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20170025919-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100579421-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20130130515-A
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID962
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23954
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID12438
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID454461350
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23712892
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID412833275
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID452506218
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID752
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID453265332
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID414206935
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID24963
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID451483236
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID25251
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419578517
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419579414
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID8897
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID451110572
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419512635
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID7322
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID440409
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID9794626
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419557109
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID24826
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID415079102

Total number of triples: 46.