Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c16d2144a81bfa32a665dca1e93c3d37 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-2253 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-7848 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-408 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-762 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-823821 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02225 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-42316 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02293 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-66795 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-435 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-324 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-36 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02164 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02181 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-165 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-785 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-66553 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76232 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76229 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-66545 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-36 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-43 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-324 |
filingDate |
2017-11-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a1ef982532360cf6965e95c748db9cf6 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_aa47b0c65a95ee3029d44b5ecee529ba http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dfbc1c94c3df620a48322737a3eaf738 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_741e271446c234edca45ff4d5002c71c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ba8db422972ccb1ac3fdebb08ef5c3de http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c837644a23a9ac6a9c25eccd6373f87f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_205dec6174d06aa5e64e0c2d379848ae |
publicationDate |
2019-05-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
KR-20190052496-A |
titleOfInvention |
Semiconductor device and Method of fabricating the same |
abstract |
A semiconductor device and a method of manufacturing the same are provided. A method of manufacturing a semiconductor device includes forming sequentially first and second epitaxial layers on a semiconductor substrate; Forming a well impurity layer doped with first dopants of a first conductivity type in the second epitaxial layer; Forming a channel layer on the second epitaxial layer including the well impurity layer; Patterning the channel layer and the second epitaxial layer to form active patterns, each of the active patterns including a second epitaxial pattern and a channel pattern on the second epitaxial pattern; Forming a gate electrode across the active patterns; And forming source and drain impurity layers in the channel patterns of the active patterns on both sides of the gate electrode. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20210118322-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20230012829-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20230060982-A |
priorityDate |
2017-11-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |