Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_44f04d319aaa6e66f240244bc905f452 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-125 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-1295 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28568 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-1229 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02205 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-1204 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02562 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C18-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-285 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C18-12 |
filingDate |
2017-10-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_899e6f142aa4ff3f544575163a0466a9 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b5ee1f909c6372510f9bb9a5106b19d3 |
publicationDate |
2019-05-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
KR-20190048300-A |
titleOfInvention |
Fabrication of transition metal telluride thin film using microwave heating |
abstract |
(A) coating a precursor solution comprising a transition metal precursor, a tellurium precursor and an ionic liquid on a conductive substrate to produce a conductive substrate coated with a precursor solution; And (b) irradiating microwave to the conductive substrate coated with the precursor solution to prepare a transition metal telluride thin film on the conductive substrate; And a transition metal telluride thin film containing the transition metal telluride. The thin film of the transition metal telluride thin film of the present invention can be formed quickly and inexpensively in a large area by a solution process using a microwave. The method for preparing the transition metal telluride thin film of the present invention can control the thickness of a thin film and can produce a uniform thin film having excellent crystallinity on a substrate. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-115261818-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-113136624-A |
priorityDate |
2017-10-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |