| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_33c922e05f6133b7d72dbb849d77487d |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-037
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G73-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L79-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G73-1085
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D179-08 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-037
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D179-08 |
| filingDate |
2018-07-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b1150d10f7440a595a7aae164fbb0842
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e7a1a85d8f97bb386aa64c4524c12fad |
| publicationDate |
2019-03-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20190031131-A |
| titleOfInvention |
Photosensitive resin composition and cured film comprising the same |
| abstract |
The present invention relates to a photosensitive resin composition and a cured film comprising a poly (imide-benzoxazine) block copolymer. The poly (imide-benzooxazine) block copolymer contained in the photosensitive resin composition of the present invention makes it possible to form a cured film having excellent mechanical properties and insulation even at a low temperature of less than 200 캜. |
| priorityDate |
2017-09-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |