| abstract |
[Problem to be solved] A photosensitive resin composition which can form a thick film easily and can form a fine pattern, has excellent crack resistance and various film characteristics, and can form a resin film excellent in reliability as a coating film, A photosensitive dry film, a laminate using the same, and a pattern forming method. A photosensitive resin composition comprising (A) a silicone resin comprising a repeating unit represented by the following formula (a1) and a repeating unit represented by the following formula (b1), (B) a filler, and (C) . Wherein X 1 is a bivalent group represented by the following formula (1); (Wherein Y < 1 > is a single bond or Is a divalent organic group selected from, R 11 is a hydrogen atom or a methyl group, R 12 and R 13 is an alkoxy group of the alkyl group, having 1 to 4 carbon atoms or a group having 1 to 4 carbon atoms, a is 0~7, b and c are 0 ≪ / RTI > |