| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8d0fc2b70675ee19bd5fc464f5ae9061 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2012
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0274
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-168
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02601 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-16 |
| filingDate |
2017-08-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f7896acaab6c26497dd146f94a38f5e8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0169cb4155548f6b1588d932a165a184
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fa4dc278aae5e7469daf388cdbbbe0fd
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_da4abe9d02002b0926ce74a714918cb2 |
| publicationDate |
2019-02-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20190016257-A |
| titleOfInvention |
Low temperature flow lithography method and low temperature flow lithography system |
| abstract |
The present invention relates to a cryogenic fluid lithography method and a cryogenic fluid lithography system, wherein the cryogenic fluid lithography method comprises the steps of: (a) flowing a photocurable fluid (1) into a microchannel (10); and (b) irradiating the microchannel (10) with light (3) to synthesize fine particles (5), wherein steps (a) and (b) Lt; RTI ID = 0.0 > low < / RTI > |
| priorityDate |
2017-08-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |