| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_669c01133740c5233f2c8738904ea3af |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C33-3842
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31144
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0271
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C59-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0002
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C59-002
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C33-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C33-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-66 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-66
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29C33-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-311
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29C59-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00 |
| filingDate |
2017-05-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_aab68c4b4b50d3878f91d34b4a3a75d5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_24309b66389c6a76d89b792346dde54a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9366d564e31c4c7aab4f4ab13f818a7e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_128dba5c615b724b90c561ba7c1db8d0 |
| publicationDate |
2019-02-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20190013764-A |
| titleOfInvention |
Template and template blank, method of manufacturing template substrate for imprint, method of manufacturing template for imprint and template |
| abstract |
A template 1 used for imprint lithography in which a transfer pattern 23 of a concavo-convex structure is transferred to a resin on a transfer target substrate in order to suppress the influence of leakage of exposure light at the time of imprint while maintaining the height of a necessary transfer pattern area, 1. A template blank comprising a first step structure (21) formed on a major surface of a base (10), a second step structure (22) formed on the first step structure (21) The outer surface of the second step structure 22 on the upper surface of the first step structure 21 is covered with the light shielding film 21. |
| priorityDate |
2016-05-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |