| abstract |
[PROBLEMS] To provide a novel low resist film forming composition. [Means for Solving the Problem] The following formula (1a) and / or formula (1b) [In the formulas (1a) and (1b), two R 1 s each independently represent an alkyl group, an alkenyl group, an aromatic hydrocarbon group, a halogen atom, a nitro group or an amino group, and two R 2 s each independently represent a hydrogen atom, , An acetyl group, an acyl group or a glycidyl group, R 3 represents an aromatic hydrocarbon group or a heterocyclic group which may have a substituent, R 4 represents a hydrogen atom, a phenyl group or a naphthyl group, each independently represents 0 or 1, m is an integer of from 3 to 500, p is an integer of from 3 to 500, X is -C 2 that represents a benzene ring, the benzene ring bonded (CH 3) 2 -Group is in the relation of a meta position or a para position], and a solvent. |