| abstract |
[PROBLEMS] To provide a composition for forming a resist lower layer film having excellent storage stability at room temperature. A lithographic resist underlayer film comprising a nitrogen-containing compound having 2 to 6 substituents represented by the following formula (1) bonded to a nitrogen atom in one molecule, a polymer, a compound for promoting a crosslinking reaction, and an organic solvent Forming composition. The nitrogenous nitrogen compound having 2 to 6 substituents represented by the above formula (1) in one molecule is, for example, a glycoluril derivative represented by the following formula (1A). (Wherein R 1 independently represents a methyl group or an ethyl group, and R 2 and R 3 each independently represent a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, or a phenyl group.) |