| abstract |
The present invention relates to a plasma reactor having a function of controlling the distribution of low frequency RF power, the plasma reactor having a conductive base therein, a conductive base connected to a low frequency RF source through a first matching unit, an ESC on the conductive base, Wherein a coupling ring surrounds the periphery of the conductive base and a focusing ring is provided in the upper direction of the coupling ring and the focusing ring surrounds the ESC and is exposed to the plasma during the plasma processing process, ; An annular electrode positioned above the coupling ring; And a conductive connection portion, wherein the conductive connection portion includes at least a lead wire, the first terminal is connected to the conductive base electrically connected to the conductive base, and the second terminal is connected to the annular electrode And a variable impedance is connected in series to the lead. |