http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20180134104-A

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publicationDate 2018-12-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20180134104-A
titleOfInvention Method for manufacturing pellicle
abstract BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of manufacturing a pellicle for lithography used as a vibration damping film when manufacturing a semiconductor device or a liquid crystal display or the like, and more particularly, to a method of manufacturing a pellicle for ultraviolet ray. B) attaching a pellicle film to the organic material substrate; c) attaching the organic material substrate on which the pellicle film is formed to a transfer frame; d) And e) transferring the pellicle film attached to the transfer frame to the pellicle frame. INDUSTRIAL APPLICABILITY According to the present invention, it is possible to produce a pellicle having an inorganic pellicle film with a very thin thickness and a good condition without wrinkles.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20210031664-A
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