abstract |
Acid generator compounds which are particularly useful as photoresist composition components are provided. The acid generator compounds of the present invention comprise 1) a cyclic sulfonium salt and 2) a covalently bonded photoacid-labile group. In one aspect, thiosantronic acid generator compounds are particularly preferred, for example, acid generator compounds include (i) thioxanthone moieties; And (ii) at least one covalently bonded acid labile group. |