| abstract |
Provided is a negative photosensitive resin composition which is highly sensitive, excellent in halftone characteristics, capable of obtaining a pattern shape with a low taper, and capable of developing alkali. (A1) a weakly acidic group-containing resin, and (A2) an unsaturated group-containing resin as the alkali-soluble resin (A) Wherein the resin having an acid group having an acid dissociation constant in the range of 13.0 to 23.0 and the unsaturated group-containing resin (A2) has an ethylenically unsaturated double bond group. |