http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20180113215-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2006 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0044 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-325 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-162 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-168 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0042 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0043 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26 |
filingDate | 2017-03-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3d6af8dd7c0cc87e9165369a4681065f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ea0ac96f61e2222852f331ec0ed094e4 |
publicationDate | 2018-10-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | KR-20180113215-A |
titleOfInvention | Method of purifying active radiation or radiation-sensitive compositions, methods of purifying active radiation or radiation-sensitive compositions, methods of preparing active radiation or radiation-sensitive compositions, methods of pattern formation, and methods of manufacturing electronic devices |
abstract | There is provided an actinic ray-sensitive or radiation-sensitive composition capable of forming a pattern having excellent resolution and less residual defect. The actinic ray or radiation-sensitive composition obtained by the actinic ray-sensitive or radiation-sensitive composition, the method of purifying the actinic radiation-sensitive or radiation-sensitive composition, and the process for preparing the actinic- The sodium content, the magnesium content, and the iron content are 50 mass ppm or less based on the total solid content of the actinic radiation-sensitive or radiation-sensitive composition, respectively. The pattern forming method includes a method of purifying or preparing a sensitizing actinic ray or radiation-sensitive composition. A manufacturing method of an electronic device includes the pattern forming method. |
priorityDate | 2016-03-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 423.