Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-281 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-325 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-162 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2006 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-168 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-283 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
filingDate |
2018-03-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e8c71d33c77b0cfbfdbf78e05c311a43 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_11e1e95573cdbb69e17880f0542427b6 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c5f0fd304649b4dd192913703efeba93 |
publicationDate |
2018-10-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
KR-20180111632-A |
titleOfInvention |
Resist composition and method of forming resist pattern |
abstract |
A resist composition which generates an acid upon exposure to light and changes its solubility in a developer by the action of an acid, which comprises a base component (A) in which the solubility in a developer is changed by the action of an acid, A) contains a structural unit (a01) represented by the following general formula (a0-1) and a polymeric compound (A1) having a structural unit (a1) containing an acid-decomposable group whose polarity is increased by the action of an acid , The structural unit (a1) is a structural unit containing an acid dissociable group represented by the following general formula (a1-r-1) and an acid dissociable group represented by the following general formula (a1-r-2) Wherein the photoresist composition is a photoresist composition. [Chemical Formula 1] |
priorityDate |
2017-03-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |