| abstract |
1. A resist composition which generates an acid upon exposure to light and changes solubility in a developer by the action of an acid, wherein the resist composition comprises a base component (A) in which the solubility in a developer is changed by the action of an acid, (D1) represented by the following general formula (1). In the general formula (d1), R d01 and R d02 are each independently a cyclic group which may have a substituent, a chain alkyl group which may have a substituent, or a chain-like alkenyl group which may have a substituent. Alternatively, R d01 and R d02 may combine with each other to form a condensed ring. m is an integer of 1 or more, and M m + represents an organic cation of m. [Chemical Formula 1] |