| abstract |
A resist composition which generates an acid upon exposure to light and changes its solubility in a developer by the action of an acid, comprising a base component (A) in which the solubility in a developer is changed by the action of an acid, Wherein the fluorine-containing additive component (F) comprises a fluorine-containing additive component (F) and the fluorine-additive component (F) comprises a fluorine resin component (F1) having a constituent unit (f1) derived from a compound represented by the following general formula (Wherein W is a polymerizable group-containing group, Rf 1 and Rf 2 are each independently a hydrogen atom or an electron-withdrawing group, and Rf 3 is a hydrocarbon group). [Chemical Formula 1] |