| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ed62b7551998e54b35784cdbbb2778d5 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D50-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D45-08 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45578
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67017
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67103
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4402
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-405
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02312
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-448
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45544 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-67
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02 |
| filingDate |
2018-03-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2c522cb827d1e70722bd51fb056839b7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3b798f3d6179729f22ab4e160f70aa53 |
| publicationDate |
2018-10-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20180109685-A |
| titleOfInvention |
Substrate processing apparatus, vaporization system, mist filter and method of manufacturing semiconductor device |
| abstract |
The present invention provides a configuration for efficiently vaporizing a liquid raw material and supplying it to the process chamber. A processing chamber for accommodating a substrate; A processing gas supply system for supplying a processing gas to the processing chamber; And an exhaust system for exhausting the process chamber, wherein the process gas supply system includes a vaporizer to which a liquid raw material is supplied and a mist filter disposed downstream of the vaporizer, There is provided a configuration in which a plurality of at least two types of plates each having a groove at a position facing the flow direction of the mist-like raw material are provided. |
| priorityDate |
2017-03-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |