| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6f932d94618d9b875e401457b33e9761 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-30604 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K13-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306 |
| filingDate |
2017-03-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_76e18c4f64dd0775ff0c2b3f723a1c57
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_667a659bfc93a89f972f1e1ea5bb5aac
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_68dee2e39838fe96ee1041a83cfd2a2c |
| publicationDate |
2018-10-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20180105827-A |
| titleOfInvention |
Etching composition for conductive layer and manufacturing semiconductor device using the same |
| abstract |
The conductive film etchant composition of the present invention has an excellent etching property for a metal nitride film, for example, and also has an etching inhibiting property for a metal film, so that an optimum etching selectivity in a multilayered film can be realized. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20200113458-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2020197056-A1 |
| priorityDate |
2017-03-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |