| abstract |
A post-chemical-mechanical-polishing (post-CMP) cleaning composition comprising or consisting of (A) polyacrylamide, polyhydroxyethyl (meth) acrylate (PHE (M) A), polyvinylpyrrolidone (PVP), polyvinyl alcohol (PVA), polymers of formula (I) At least one nonionic polymer selected from the group consisting of (I) Wherein R 1 is hydrogen, methyl, ethyl, n-propyl, iso-propyl, n-butyl, iso-butyl, or sec-butyl, R 2 is hydrogen or methyl, (B) a poly (acrylic acid) (PAA) or acrylic acid-maleic acid copolymer having a mass average molar mass (Mw) of 10,000 g / mol or less, and (C) water, (The pH of the composition is in the range of 7.0 to 10.5). |