abstract |
The present invention relates to an adsorbent for removing exhaust gas from a semiconductor material and a method for producing the same, and more particularly, to an adsorbent for removing an exhaust gas from a semiconductor, which comprises an activated carbon carrier supported on an inorganic material solution, CeCO 3 is added to the inorganic solution used as a solution to increase the adsorption power of the adsorbent by preventing the aggregation of the inorganic solution and increase the adsorption power of the porous carrier selected from the group consisting of silicon dioxide, aluminum oxide, pseudoboehmite, and zeolite The present invention also relates to an adsorbent for removing exhaust gas from a semiconductor material and a method for producing the adsorbent. |