| abstract |
The present invention relates to a method of producing a thin inorganic film on a substrate, in particular to an atomic layer deposition method. The present invention relates to a process comprising converting a compound of formula (I) into a gas or an aerosol, and depositing a compound of formula (I) on a solid substrate in the gas or aerosol state: Wherein M is Mn, Ni, or Co, X is a ligand coordinating to M, n is 1, 2, or 3, R 1 and R 2 are alkyl, alkenyl, aryl, M is 1, 2, or 3; R 3 , R 4 , and R 5 are an alkyl group, an alkenyl group, an aryl group, an alkoxy group, or an aryloxy group; p is 1, 2, or 3 to be. |