| abstract |
The present invention provides an etching composition used for etching a transition metal film used as an electrode or the like of a TFT-LCD display, wherein the etching composition according to the present invention has a remarkably improved number of treatments, even when the metal ion content in the etching solution is high. The TFT-LCD display has excellent etching characteristics such as bias, taper angle and tail length. And can be usefully used for manufacturing OLED electrodes. |