Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ccfee51074117c6961593015b14f0dd9 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L2201-56 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D139-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D139-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-168 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-405 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D139-04 |
filingDate |
2016-11-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5101af4de97d10db3998d588e9e27890 |
publicationDate |
2018-07-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
KR-20180083917-A |
titleOfInvention |
COMPOSITION FOR FORMING MINERAL RESIST PATTERN AND METHOD FOR FORMING PATTERN USING THE SAME |
abstract |
The present invention relates to a shrinkage material composition for thickening a resist pattern produced by a negative tone lithography process, comprising at least one polymer comprising at least one structural unit of a nitrogen heteroaromatic ring system and at least one organic solvent will be. |
priorityDate |
2015-11-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |