abstract |
The present invention relates to a resist composition which generates an acid upon exposure and which has a solubility in a developing solution changed by the action of an acid, as a resist composition containing a polymer compound having at least two specific constituent units. The present invention also includes a step of forming a resist film on a support using the resist composition, a step of exposing the resist film, and a step of patterning the resist film after development by development using a developing solution to form a resist pattern The present invention also relates to a method of forming a resist pattern. |