| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_069a92549123806a5d654dc036a676e9 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76873
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-2885
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76861 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D21-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D21-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D7-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D5-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D5-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-288
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-6723
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D17-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D21-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D17-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D21-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D17-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D17-001
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D7-123 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D5-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D7-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D17-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D17-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D21-12 |
| filingDate |
2017-11-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f526929428a4b508120d7b33a592e66f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_851e2c94a4083c0d3e8ee96cb2497fb9
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_032a0b46f16838db85a937ed2eeb70b9 |
| publicationDate |
2018-06-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20180071161-A |
| titleOfInvention |
Plating apparatus, plating method and a computer readable recording medium |
| abstract |
The hydrophilicity of the surface of the substrate is improved and the degree of hydrophilicity of the substrate is prevented from varying. There is provided a plating apparatus for performing a plating process on a substrate having a resist pattern. This plating apparatus has a pretreatment unit for bringing the pretreatment liquid into contact with the surface of the substrate and a plating tank for performing plating treatment on the substrate having the pretreatment liquid brought into contact with the surface to be treated. The pretreatment unit includes a holding support for holding the surface to be processed of the substrate upward, a motor configured to rotate the holding support, a hydrophilization processing unit configured to irradiate ultraviolet rays on the surface to be processed, And a pretreatment liquid supply unit configured to supply the pretreatment liquid to the reverse surface. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102338157-B1 |
| priorityDate |
2016-12-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |