| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_50b9eafeeb1aec2e20b4c56847e4b08b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c63bc5ef3ae590b0603de4587961cac3 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3171
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02315
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-265
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-46
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-425 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-317
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-425
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-265
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-46 |
| filingDate |
2016-12-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7edd93d99e47ba6b3579fdc339574367
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bf4b159b8754be96b3146bf0311def1a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e54fc93682422882b633c0d25b16ef2a |
| publicationDate |
2018-06-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20180066922-A |
| titleOfInvention |
Ion source head and ion implantation apparatus including the same |
| abstract |
An ion source head according to an embodiment of the present invention includes: a reaction chamber for providing an ionization space; A plasma generation coil disposed on an outer surface of the reaction chamber to receive an RF power and form an induction magnetic field in the reaction chamber to ionize the source gas supplied to the reaction chamber; And a high frequency power source for applying the high frequency power to the plasma generation coil. |
| priorityDate |
2016-12-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |