http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20180063287-A

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filingDate 2016-11-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_38769e87b9f61a56e97dc16c5a7c1e88
publicationDate 2018-06-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20180063287-A
titleOfInvention The light-
abstract The present invention relates to a light-transmitting conductive material having a structure in which two conductive layers composed of an upper conductive layer and a lower conductive layer are laminated via an insulating layer, wherein the upper conductive layer and the lower conductive layer are electrically connected And the sensor portion and the dummy portion are constituted by irregular metal fine line patterns having a mesh shape and the sensor portion of the downwardly conductive layer is arranged in the first direction And a plurality of rows of elongated column electrodes are arranged in a cycle L with respect to a second direction perpendicular to the first direction with the dummy portion interposed therebetween, And extending in a fourth direction in a fourth direction perpendicular to the third direction with the dummy portion interposed therebetween, (Center) of the column electrode of the lower conductive layer and the center line of the column electrode of the lower conductive layer as the center of gravity, and the center line of the column electrode of the lower electrode layer in the second direction And a straight line in which the center line of the column electrode of the upper electrode layer is shifted by 1/2 of the same length as the period M in the fourth direction, , A node-by-node zone that shares a side of a rectangle that it has with respect to any one node-unit zone is referred to as a neighboring node-unit zone, and within the node-unit zone, A rectangle having a diagonal length of 80% with respect to a diagonal line length is defined as a reduced rectangle A, and within a neighboring node unit area, The mesh shape of the metal thin line pattern in the reduced rectangle A and the metal thin line pattern in the reduced rectangle B in each of the upper conductive layer and the lower conductive layer in the case where the rectangle having the diagonal length of 80% And the total length of the metal thin lines in the reduced rectangle A is 95 to 105% of the total length of the metal thin lines in the reduced rectangle B.
priorityDate 2015-11-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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