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publicationDate 2018-05-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20180055116-A
titleOfInvention Method for preparing porous polyurethane polishing pad
abstract The present invention relates to a method of manufacturing a porous polyurethane polishing pad for use in a chemical mechanical planarization (CMP) process of semiconductors, wherein the porous polyurethane polishing pad produced according to the manufacturing method of the embodiment comprises a large pore ) And a small pore (fine pores), thereby increasing the polishing efficiency through the fine pores and increasing the flow rate of the slurry through the mesopores, thereby enhancing the overall polishing efficiency.
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