http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20180050665-A

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filingDate 2016-09-08-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cefa9ac620243efd3d30dd8694d00a8d
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publicationDate 2018-05-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20180050665-A
titleOfInvention COMPOSITION, RESIN, RESIST COMPOSITION OR RADIATION RADIATIVE COMPOSITION, RESIST PATTERN FORMING METHOD, AMORPHOUS FILM PRODUCTION METHOD, LITHOGRAPHY ROW LAYER FILM FORMING MATERIAL, COMPOSITION FOR FORMING LITHOGRAPHY UNDERLAY FILM
abstract A compound represented by the following formula (1) and / or a resin containing this compound as a constituent component is used. (One) (In the formula (1), R 1 is a 2n-valent group or a single bond having 1 to 60 carbon atoms, and R 2 to R 5 each independently represent a linear, branched or cyclic alkyl group having 1 to 10 carbon atoms, An alkenyl group having 1 to 10 carbon atoms, an alkoxy group having 1 to 30 carbon atoms, a halogen atom, a thiol group, a hydroxyl group or a hydroxyl group substituted with an acid-dissociable group, provided that at least one of R 2 to R 5 M 2 and m 3 are each independently an integer of 0 to 8, m 4 and m 5 are each independently an integer of 0 to 9, , M 2 , m 3 , m 4 and m 5 do not become 0 at the same time, n is an integer of 1 to 4, and p 2 to p 5 each independently represent an integer of 0 to 2.)
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20170033265-A
priorityDate 2015-09-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 40.