| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ed62b7551998e54b35784cdbbb2778d5 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L22-10 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67109
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0228
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-6719
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67745
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0223
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67201
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67196
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02318
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67248
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L22-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67742
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67739
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-683
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67748
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-6838
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-68707
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02164
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0217
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67011
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67098 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-683
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-677
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-67 |
| filingDate |
2017-02-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4b7cc598bb025dca86eb968d5698f57d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f0c4fa01f8fab0ee0f45e9e03d2587ac |
| publicationDate |
2018-04-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20180035108-A |
| titleOfInvention |
Substrate processing apparatus, method of manufacturing semiconductor device and non-transitory computer-readable recording medium |
| abstract |
Thereby improving processing uniformity for each substrate. A plurality of processing chambers for processing substrates; A heating unit installed in each of the plurality of processing chambers to heat the substrate to a predetermined temperature; A vacuum transport chamber connected to a plurality of process chambers; A transfer robot installed in the vacuum transfer chamber and capable of transferring a plurality of substrates; A load lock chamber connected to the vacuum conveyance chamber; A support provided in the load lock chamber for supporting a substrate processed in the process chamber; An inert gas supply unit for supplying an inert gas to the load lock chamber; And the cooling recipe are recorded on the cooling recipe and the substrate are heated to a predetermined temperature in the processing chamber, the substrate is transferred from the processing chamber to the load lock chamber, the cooling recipe corresponding to the temperature of the substrate is read from the storage device, And a controller for controlling the inert gas supply unit and the storage device so as to cool the substrate by supplying an inert gas to the substrate based on the inert gas. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20210100184-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11302550-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20200110122-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20200012665-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11289350-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20200036778-A |
| priorityDate |
2016-09-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |