http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20180033072-A

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filingDate 2017-09-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2018-04-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20180033072-A
titleOfInvention Substrate treating device and substrate treating method
abstract Disclosed is a technique capable of more reliably maintaining the concentration of a treatment liquid in a treatment tank at a concentration suitable for treatment to be performed in the treatment tank, in a substrate treatment apparatus or a substrate treatment method. A substrate processing apparatus for performing etching treatment on a substrate by immersing the substrate in a mixed acid aqueous solution includes a treatment tank in which a mixed acid aqueous solution is stored and a treatment for completely replacing the mixed aqueous solution in accordance with a lifetime of the mixed acid solution in the treatment tank And a control unit for controlling the concentration of pure water to a predetermined target concentration by supplying pure water to the mixed aqueous solution in the treatment tank based on the pure water concentration detected by the detection unit, And a target value changing unit for changing a lower reference value (target concentration).
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20200060484-A
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