http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20180029873-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G73-1078 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0387 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G69-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G73-1075 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G69-26 |
| filingDate | 2017-09-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2ed51fe5e6922ebe064b7f5c1b34543e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a4b82f3811cc59f804f728979e50b55c |
| publicationDate | 2018-03-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20180029873-A |
| titleOfInvention | Photosensitive resin composition, polyamide resin, production method of polyamide resin, compound, production method of compound, production method of cured film and cured film |
| abstract | [PROBLEMS] To provide a photosensitive resin composition capable of forming a cured film having good adhesion to a substrate and having excellent transparency, a polyamide resin preferably used in the photosensitive resin composition, a process for producing the polyamide resin, A method for producing the compound, a method for producing a cured film using the photosensitive resin composition described above, and a cured film obtained by curing the above-mentioned photosensitive resin composition. [MEANS FOR SOLVING PROBLEMS] A photosensitive resin composition comprising a resin (A) and a photopolymerization initiator (B), wherein the resin (A) contains a saturated alicyclic skeleton and at least one of the carboxyl groups contains a polymerizable group having a predetermined structure A polyamide resin containing a structural unit esterified with a unit derived from a polyamide resin is used. |
| priorityDate | 2016-09-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 480.