| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ed62b7551998e54b35784cdbbb2778d5 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67772
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0217
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02211
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0228 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45589
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-345
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67772
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4584
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4408
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67017
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45591
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67739
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45578
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67196
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67242
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67313
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-54
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67766
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67775
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45546 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-677
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-67 |
| filingDate |
2016-06-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a6d65e9596cf211cc4e8eb656fb32c7b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_96124b576a22a80c1be8e825b1670fe7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c85d680df7d748b9b74411a98aa7b2ad |
| publicationDate |
2018-02-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20180017180-A |
| titleOfInvention |
Substrate processing apparatus, method of manufacturing semiconductor device, and recording medium |
| abstract |
The present invention shortens the time for reducing the oxygen concentration in the transport chamber. A transfer chamber for transferring the substrate from a storage container for containing the substrate; A purge gas supply mechanism for supplying a purge gas into the transport chamber; And a pressure control mechanism provided in the exhaust passage for exhausting the atmosphere in the transport chamber and controlling the pressure in the transport chamber, wherein the pressure control mechanism includes an exhaust damper for opening or closing the exhaust passage; And an adjustment damper provided in the exhaust damper and configured to hold the inside of the transport chamber at a predetermined pressure. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20200110196-A |
| priorityDate |
2015-08-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |