| abstract |
[PROBLEMS] To provide a radiation-sensitive composition having a phenol-plast-crosslinkable siloxane polymer as a base resin, which has excellent resolution and can form a pattern of a desired shape with good precision. [MEANS FOR SOLVING PROBLEMS] A radiation-sensitive composition comprising a hydrolyzable silane as a silane, a hydrolyzate thereof, or a hydrolyzed condensate thereof and a photoacid generator, wherein the hydrolyzable silane comprises formulas (1) and (2). R 1 a R 2 b Si (R 3 ) 4 - (a + b ) [In the formula (1), R 1 is a group represented by the formula (1-2): R 7 c R 8 d Si (R 9 ) 4 - (c + d) represents an organic group represented by formula (2) and is bonded to a silicon atom by a Si-C bond or a Si-O bond. Represents an organic group. And R 3 represents a hydrolyzable group. [In the formula (2), R 7 is a group represented by the formula (2-1): And is bonded to a silicon atom by a Si-C bond. R 8 is an organic group and is bonded to a silicon atom by a Si-C bond. And R 9 represents a hydrolyzable group. |