| abstract |
A pattern forming method and a device manufacturing method capable of suppressing both deformation of the pattern after etching (change in line width roughness (? LWR)) and disconnection of the pattern after etching. A photocurable composition containing a monofunctional (meth) acrylate represented by the following general formula (I) and a photopolymerization initiator; Wherein R 1 represents a hydrogen atom or a methyl group, R 2 represents an alkyl group which may be substituted with a fluorine atom, R 3 represents a hydrogen atom, a straight chain alkyl group which may be substituted with a fluorine atom, R 4 to R 8 each independently represent a hydrogen atom, a halogen atom, a straight chain alkyl group having 1 to 4 carbon atoms, or a branched alkyl group having 3 or 4 carbon atoms; The sum of the number of carbon atoms contained in R 2 and R 3 is 1 to 6; R 2 and R 3 , or R 2 and R 4 may be bonded to each other to form a ring. |