http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20180001469-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_24aca9ded2638ea793d05360dde7a4a0 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F20-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C309-84 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-168 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C309-84 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 |
filingDate | 2017-06-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d5783c924eb99533d01f0b89dc260e78 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a144f3526dc1d67cb5c2c69f8714bf36 |
publicationDate | 2018-01-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | KR-20180001469-A |
titleOfInvention | Compound, acid generator, polymer, resist composition and method of producing resist pattern |
abstract | A compound represented by formula (I). [In the formula (I) Q 1 and Q 2 each independently represent a fluorine atom or a perfluoroalkyl group having 1 to 6 carbon atoms. R 1 and R 2 each independently represent a hydrogen atom, a fluorine atom or a perfluoroalkyl group having 1 to 6 carbon atoms. z represents any integer of 0 to 6, and when z is 2 or more, plural R 1 and R 2 may be mutually the same or different. X 1 represents C (R 1 ) (R 2 ) or C (O), * 1-CO-O-, * 1 -O-CO-, -O- Q 1 ) (Q 2 ). A 1 represents a divalent hydrocarbon group having 2 to 36 carbon atoms which may have a substituent, and -CH 2 - contained in the hydrocarbon group is substituted with -O-, -S-, -CO- or -SO 2 - . X 2 represents * 2-CO-O-, -O-CO-O- or -O-, and * 2 represents a bonding site to A 1 . R 3 and R 4 each independently represent a hydrogen atom or a saturated hydrocarbon group having 1 to 6 carbon atoms. X 3 represents a group represented by any one of formulas (X 3 -1) to (X 3 -8). (Of the formulas (X 3 -1) to (X 3 -8) * Represents a bonding site with C (R 3 ) (R 4 ).) R 5 represents an alkyl group having 1 to 6 carbon atoms which may have a halogen atom, a hydrogen atom or a halogen atom. R 6 represents an aromatic hydrocarbon group having 6 to 12 carbon atoms which may have a substituent. R 7 represents a hydrocarbon group or a cyano group having 1 to 12 carbon atoms which may have a substituent, and -CH 2 - included in the hydrocarbon group is -O-, -S-, -SO 2 - or -CO- And may be substituted.] |
priorityDate | 2016-06-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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