| abstract |
[PROBLEMS] To provide a polymer suitable as a base resin of a negative type resist material having a high resolution and a small line edge roughness over conventional negative resist materials, a negative type resist material containing the same, and a pattern forming method using the same. A polymer comprising a repeating unit represented by the following formula (a), a repeating unit represented by the following formula (b) and a repeating unit represented by the following formula (c) and having a weight average molecular weight of 1,000 to 500,000. |