| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_799858790a0d932d2bf525d1f2324ad6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_050fc7b82c5d17d9aeb63a7cdcc546b3 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67051
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67207
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-683 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-683
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-67
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02 |
| filingDate |
2017-11-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_21e9c4d28faf63e2509ba53c7a9f1948
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c048bcb54e394a63f06035fe5200be71
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_01daccffcd2d77b968f7ec94c01c46d3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2b5205204af2e7988dfd8d6605f6a43c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f5b31758bd17d556b0b486291c5cab49
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_91601f6125f2c3e3a6c6398e16e583d2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9306f722182362a155bf61ca5045e030
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_79a2707f7a9113df1aae33c570759ed7 |
| publicationDate |
2017-11-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20170128189-A |
| titleOfInvention |
Apparatus and method for treating Substrate with the nozzle |
| abstract |
The present invention relates to a substrate processing apparatus. A substrate processing apparatus according to the present invention includes: a chamber for providing a space for processing a substrate; A support unit provided inside the chamber to support the substrate; And a nozzle for supplying a cleaning medium to the substrate supported by the support unit, wherein the nozzle comprises: a contraction portion having an inlet through which the cleaning medium flows, the contraction portion decreasing in cross-sectional area away from the inlet; An expansion unit having an ejection port through which the cleaning medium is ejected and whose cross-sectional area increases as the ejection port approaches the ejection port; And an orifice positioned between the contraction portion and the expansion portion, wherein the cleaning medium flowing into the contraction portion is a single gas. |
| priorityDate |
2017-11-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |