| abstract |
The photoacid generator compound of the present invention has the following formula (1) Wherein R, a, b, c, d , e, x, L 1, L 2, L 3, L 4, R 1, R 2, X, and Z - is as defined in the present specification. The photoacid generator compound exhibits excellent stability in solvents and negative tone developers generally used for preparing photoresist compositions. A photoresist composition comprising a photoacid generator compound, a coated substrate comprising the same, a method of forming a device using the photoresist composition are described herein. |