http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20170125358-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-56 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2014 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 |
| filingDate | 2016-03-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_075a3a80b789dfad4c9a83d380354072 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fc5ec654fdab69aba5e5ee430a267bb4 |
| publicationDate | 2017-11-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20170125358-A |
| titleOfInvention | Negative-acting active ray-sensitive or radiation-sensitive resin composition, negative-acting active ray-sensitive or radiation-sensitive film, pattern forming method, and manufacturing method of electronic device |
| abstract | Particularly, in the formation of a pattern of ultrafine (for example, a line width of 50 nm or less), it is possible to form a pattern having excellent sensitivity, resolution, PED stability, and line edge roughness (LER) And a mask blank having a negative active ray-sensitive or radiation-sensitive film, a negative active ray-sensitive or radiation-sensitive film using the same, a pattern forming method, and an electron A method of manufacturing a device is provided. Mask blank is, (A) to by a polymer having a repeating unit represented by the general formula (1) compound and, (B) irradiation of actinic ray or radiation, and the volume is 130Å 3 above comprising a compound capable of generating an 2000Å 3 or less acid Sensitive negative active radiation-sensitive or radiation-sensitive resin composition, and negative-acting actinic ray-sensitive or radiation-sensitive film and negative-acting actinic radiation-sensitive or radiation-sensitive film using the negative active radiation or radiation-sensitive resin composition. Wherein R 1 represents a hydrogen atom, an alkyl group or a halogen atom, R 2 and R 3 each independently represent a hydrogen atom, an alkyl group, a cycloalkyl group, an aralkyl group or an aryl group, R 4 represents a hydrogen atom An alkyl group, a cycloalkyl group, an aryl group, or an acyl group; L represents a single bond or a divalent linking group; Ar represents an aromatic group; and m and n each independently represent an integer of 1 or more. |
| priorityDate | 2015-04-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 257.