Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F2800-20 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-322 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-162 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-168 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1808 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0395 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0274 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26 |
filingDate |
2017-03-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c788af3fd0e79721d5564f64728cea41 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d9a9c4596ed404a4ab04eef308be229b |
publicationDate |
2017-10-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
KR-20170113113-A |
titleOfInvention |
Chemically amplified positive-type photosensitive resin composition |
abstract |
[PROBLEMS] A substrate on which a chemically amplified positive photoresist composition which can be satisfactorily developed using a basic aqueous solution having a low pH and a photosensitive film comprising a photosensitive film comprising the chemically amplified positive photoresist composition is formed, Provided is a method for forming a patterned resist film using a positive photoresist composition. [MEANS FOR SOLVING PROBLEMS] An acid generator (A) which generates an acid upon irradiation with an actinic ray or radiation, a resin (B) which increases the solubility in alkali by the action of an acid, and an organic solvent A chemically amplified positive-working photosensitive resin composition, wherein at least a part of an alkali-soluble group contained in an alkali-soluble resin soluble in a basic aqueous solution having a pH of 12 is a resin in which a hydrogen atom of an alkali-soluble group is substituted with an acid dissociable, dissolution inhibiting group 1 Resin (B1) is contained in a predetermined amount of resin (B). |
priorityDate |
2016-03-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |