| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_51d028c578ae85cb937b5b34a5129fbc |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-785
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-66545
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28114
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-66795
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-42376 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-423
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-66 |
| filingDate |
2014-12-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5e2175c9219bbc793c8dde3f525f64c3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_74b593d93367e812acae50a26a4ae96c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9e140859f4b8d4bd49708f2620dd7077
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d758b195b4feaba683c252d6ee6c4046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4fc0025682c8adb27c90d36fb33f1e1a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fa7724322be0bca54a4bd313624e8c77
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3b318ad0ed3e64045ab14fad49aec168
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8e980122b0937ebb79125f5638c94801 |
| publicationDate |
2017-08-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20170097006-A |
| titleOfInvention |
Optimizing gate profile for performance and gate fill |
| abstract |
Systems and methods for optimizing gate profiles for performance and gate charging are disclosed. A semiconductor device having an optimized gate profile includes a semiconductor substrate and a fin extending over the semiconductor substrate. A pair of source and drain regions are disposed on opposite sides of the channel region. The gate stack is disposed over the channel region, and the gate stack includes a top portion that is separated from the bottom portion by a tapered portion. At least a portion of the top portion and the tapered portion is disposed on the pin. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11450758-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20210154698-A |
| priorityDate |
2014-12-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |