| abstract |
[PROBLEMS] To provide a resist underlayer film forming composition for lithography which can be used as a hard mask. By containing a trihalogenoacetamide skeleton, pattern resolution can be improved. A lithographic resist underlayer film forming process, which comprises a hydrolyzable silane as a silane, a hydrolyzate thereof, a hydrolysis condensate thereof, or a combination thereof, wherein the hydrolyzable silane has a silane having a halogen-containing carboxylic acid amide group Composition. |