http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20170085211-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3213 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-027 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3213 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 |
| filingDate | 2016-01-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0e281b2b21fb2c5d1cb506f4d47d49c1 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_813e0e460b2bf852de31d8762bc4b614 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_28822d7408eab9f123bf757caa7d3cd7 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_89680b58c6eca161856eb6452cf27828 |
| publicationDate | 2017-07-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20170085211-A |
| titleOfInvention | Composition for forming film, film, method for producing patterned substrate, and compound |
| abstract | [PROBLEMS] To provide a film-forming composition capable of forming a film having excellent heat resistance and flatness while maintaining general characteristics such as etching resistance. [Solution] The present invention is a film-forming composition containing a solvent and a compound having one partial structure represented by the following formula (1). In the following formula (1), n1 and n2 are each independently an integer of 0 to 2. k1 and k2 are each independently an integer of 0 to 9; The compound preferably has an intermolecular bond-forming group. The compound is preferably represented by the following formula (2). In the following formula (2), Z is a partial structure represented by the formula (1). Ar 1 and Ar 2 are substituted or unsubstituted C6-C20 arene diaryl groups. Ar 3 and Ar 4 are substituted or unsubstituted aryl groups having 6 to 20 carbon atoms. p1 and p2 are each independently an integer of 0 to 3; |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2020071486-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20200050879-A |
| priorityDate | 2016-01-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 244.