http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20170083492-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 |
| filingDate | 2017-01-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fd3726c45606bedd3fa574f4a8e3d8d1 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_813e0e460b2bf852de31d8762bc4b614 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_200fd164f0946145bf6fafffd4e11966 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_89abab811069c64e02454132b3ab9bc4 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cfcbea7b62c2c8449da55d2cca7dd61c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_28822d7408eab9f123bf757caa7d3cd7 |
| publicationDate | 2017-07-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20170083492-A |
| titleOfInvention | Polymer for forming resist lower layer film and method for producing the same, composition for forming resist lower layer film, resist lower layer film, and process for producing patterned substrate |
| abstract | (PROBLEMS) To provide a resist underlayer film forming polymer and a composition for forming a resist underlayer film which can form a resist underlayer film which can use PGMEA or the like as a solvent and is excellent in edge rinse resistance, solvent resistance, etching resistance, heat resistance and embeddability . (Solution) The present invention is a polymer for forming a resist lower layer film having a first repeating unit represented by the following formula (1). In the following formula (1), Ar 1 , Ar 2 and Ar 3 each independently represent a substituted or unsubstituted C6-C30 arylenediyl group. R 1 is a substituted or unsubstituted divalent hydrocarbon group of 1 to 30 carbon atoms. n is 0 or 1; R 2 is a hydrogen atom, a substituted or unsubstituted alkyl group having 1 to 10 carbon atoms or a substituted or unsubstituted aryl group having 6 to 30 carbon atoms. R 3 is a substituted or unsubstituted monovalent aromatic hydrocarbon group having 6 to 30 carbon atoms. R 4 is a hydrogen atom or a substituted or unsubstituted monovalent hydrocarbon group of 1 to 30 carbon atoms. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102133296-B1 |
| priorityDate | 2016-01-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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